European Tender Two Parallel Plate Plasma-enhanced Chemical Vapor Deposition (PECVD) Systems

# Foreword This is the Descriptive Document that forms a part of the Systems for Plasma-Enhanced Chemical Vapor Deposition public Tender started by the Contracting Party. The Contracting Party follows the public procedure in order to give all providers the opportunity to submit a Tender for this Contract. # Contents of the Contract The University of Twente is tendering to purchase two new Plasma-Enhanced Chemical Vapor Deposition systems. The MESA+ Institute will invest in two new systems for deposition of (doped) dielectric thin films to upgrade and reinforce their state-of-the-art thin film technology and processing capacity. The systems will be used for moderate-temperature deposition of low stress thin films. For the following materials: • silicon dioxide (SiO2) • boron-doped SiO2...