European Tender Electron Beam Lithography system

The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (ebeam system). A system - suitable for defining patterns in electron sensitive resists - at high resolution and high speed - compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users - i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics - (nano)-electronics etc.) and different levels of expertise. We are accessible to the idea that the new e-beam system in our laboratory is used for demo purposes by the supplier of the system. Any...