Dielectric Etcher

The ICP dielectric etcher is required for dry etching of dielectrics (SiN and SiO2) used as hard mask layers for waveguide definition. Accurate processing of such dielectric films - which is an intermediate step between DUV lithography (via existing tool) and semiconductor waveguide etching is critical for InP integrated circuits. This newly commissioned ICP etcher will be key to define dielectric patterns with high etching selectivity and high verticality - suitable for high-quality optical waveguides with well controlled optical confinement and minimized sidewall roughness. The tool will be instrumental for fabrication of waveguide components across multiple bands - both for monolithic and hybrid integration. De ICP-diëlektrische etser is nodig voor het droogetsen van diëlektrica (SiN en SiO₂) die worden gebruikt als hardmaskerlagen voor...